Hydroxybenzophenone-based stabilizers and polymers end-capped with the same

ABSTRACT

The invention relates to hydroxybenzophenone-based compounds of formula (I) that are used to improve UV, thermal, and thermo-oxidative stability of high performance aromatic polymers in a blend or as end-cappers of the same polymers.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to U.S. provisional patent applicationNo. 62/046,011 filed Sep. 4, 2014, the whole content of this applicationbeing incorporated herein by reference for all purposes.

FIELD OF THE INVENTION

The invention relates to 2-hydroxybenzophenone-based compounds that areused to stabilize oligomers and/or polymers. These compounds, referredto herein as stabilizer compounds (SC), can be used in blends withpolymers or as polymer/oligomers end-cappers. The resultant blends orcod-capped polymers (referred to as end-capped stabilized polymers(ESP)) provide improved UV stability. The disclosure further relates tomethods of synthesizing the stabilizer compounds (SC) and end-cappedstabilized polymers (ESP), polymer composition (C) including thesestabilizer compounds (SC), or end-capped stabilized polymers (ESP), andarticles made from such polymers compositions (C).

BACKGROUND AND RELATED ART

High performance aromatic polymers feature, because of their very highglass transition temperatures and/or melting temperatures, excellentproperties including an outstanding heat resistance. Aromaticpolysulfones and polyetherketones are, for example, widely used inapplications where their strength, resistance to harsh chemicals and tohigh temperatures is necessary.

Unfortunately, many natural and synthetic polymers such as the abovementioned high performance aromatic polymers are prone to lightabsorption and are attacked by UV radiation. As a result, they undergooxidation, chain scission, uncontrolled radical recombination andcross-linking reactions. This phenomenon, known as UV degradation, isusually catalyzed in high heat environments in the presence of oxygen.The UV degradation of polymers can affect a materials mechanicalproperties, produce discoloration and fading, roughen the surface,decrease tensile strength, and reduce their overall life timeperformance.

A wide range of light and heal stabilizers for polymers are known andhave been used alone or in various combinations to prevent or retard thekinetics of polymer degradation that is initiated by exposure to lightand heat. The effectiveness of stabilizers to defend a material againstUV radiation and heat depends on several factors including: theintrinsic efficacy of the stabilizer, its concentration, and itssolubility in a particular polymer matrix, as well as how well it isdistributed in the matrix. Intrinsic volatility of the stabilizer isalso an important factor to consider when working with materials whichare processed at high temperatures as it may lower the concentration ofthe stabilizer in a particular polymer matrix as a result of evaporationduring processing and subsequent use.

Over the past century, a number of light stabilizer compounds have alsobeen developed and commercialized as additives tailored to retard oreliminate photo-initiated oxidative processes. These additives aregenerally categorized into one of 4 classes: UV absorbers, excited statequenchers, radical scavengers, and peroxide decent posers. Certainderivatives of 2-hydroxybenzophenone have been known for a long time toimprove the light stability of polymeric compositions. For example, U.S.Pat. No. 3,192,179 discloses their use in low melting temperaturepolymeric materials such as certain polyester-styrene resins andpolyvinyl chloride resin.

Nearly all commercially available heat and light stabilizers are indeedwell suited for blending with low melting temperature commodity polymersrequiring low process temperatures (i.e. below 25° C.).

However, such commercial heat and light stabilizers are prone tothermo-oxidative decomposition or volatilization upon exposure to hightemperatures (i.e. above 250° C.). Therefore, they are generally poorlysuited for high performance aromatic polymers where process temperaturesare substantially more intense compared to low melting temperaturecommodity polymers.

There exists a need, therefore, to identify and develop stabilizercompounds that are well suited for high performance aromatic polymers inthat the polymer compositions made therefrom possess high temperaturemechanical performance, good thermal-oxidative stability and good lightstability.

The present invention provides such stabilizer compounds (SC),end-capped stabilized polymers (ESP), and methods for their preparationand use.

SUMMARY

The present invention relates to a stabilizer compound (SC) of thegeneral structural formula (I):

wherein:R_(j), same or different from R_(i), is selected from:

-   -   a first group consisting of a —H, a halogen, a carboxylic ester,        an acid halide, an anhydride, an amide, and a thioester,    -   a second group consisting of a hydroxyl, an amine, a carboxylic        acid, a thiol, and any protected derivatives thereof.    -   a moiety of formula (II):

-   -   a moiety of formula (II*):

andR_(i), same or different from each other and from R_(j), are selectedfrom the group consisting of —H, —NO₂, alkyl groups, alkoxy groups,perfluorinated groups, aryl groups, aryl amine groups, aryl ethergroups, aryl sulfone groups, aryl thioether groups, and fused aryl ringsystems.

Another aspect of the present invention relates to a method for themanufacture of said stabilizer compound (SC).

Still another aspect of the present invention is directed to anend-capped stabilized polymer (ESP) comprising recurring units and atleast two chain ends, wherein at least one of the chain ends comprisesthe moiety of the general structural formula (X):

wherein R_(i) are as defined above.

Yet another aspect of the present invention relates to a method tor themanufacture of said end-capped stabilized polymer (ESP).

Still another aspect of the present invention is directed to a polymercomposition (C) comprising at least one stabilizer compound (SC) or atleast one end-capped stabilized polymer (ESP) and at least one polymer(P*), different from the end-capped stabilized polymer (ESP).

Yet another aspect of the present invention relates to a method forstabilizing a polymer (P) or (P*) comprising adding at least onestabilizer compound (SC) or at least one end-capped stabilized polymer(ESP) to at least one polymer (P) or to at least one polymer (P*),wherein the polymer (P), contains at least one chain end able to reactwith the above mentioned R_(j) of formula (I), and wherein the polymer(P*) may be the same than the polymer (P), except for the fact that itdoes not have to (but may) contain at least one chain end able to reactwith the R_(j) of formula (I).

Finally, the present invention also relates to an article comprisingsaid stabilizer compound (SC), said end-capped stabilized polymer (ESP)or said polymer composition (C).

DETAILED DESCRIPTION

The Applicant has discovered that stabilizer compounds (SC) of thegeneral structural formula (I):

wherein R_(i) and R_(j) are as above defined, provide to highperformance aromatic polymers very good light resistance.

In the formula (I), R_(j) is preferably selected from:

-   -   a first group consisting of a —H, a halogen, an acid halide and,        an anhydride,    -   a second group consisting of a hydroxyl, an amine, a carboxylic        acid, and any protected derivatives thereof, or    -   a moiety of formula (II):

or

-   -   a moiety of formula (II*):

andwhere R_(i) is as above defined. In the formulas (II) and (II*), R_(i)is preferably —H.

It may sometime be advantageous to select R_(j) among the abovementioned second group, i.e. where R_(j) can be a hydroxyl (or anyprotected derivative thereof), an amine (or any protected derivativethereof), a carboxylic acid (or any protected derivative thereof), or athiol (or any protected derivative thereof).

In certain preferred embodiment, R_(j) is selected from a halogen. Mostpreferably, it is selected from —Cl and —F.

In other preferred embodiments, R_(j) is a hydroxyl or an amine or anyprotected derivatives thereof.

In the formula (I), R_(i) are selected from the group consisting of —H,—NO₂, alkyl groups, alkoxy groups, perfluorinated groups, aryl groups,aryl amine groups, aryl ether groups, aryl sulfone groups, arylthioether groups, and fused aryl ring systems.

Non limitative examples of alkyl groups are notably:

Non limitative examples of alkoxy groups are notably: —OCH₃, and—O(CH₂)_(n)CH₃, where n=1 to 11.

Non limitative examples of perfluorinated groups are notably: —CF₃, and—CH₂—(CF₂)₅CF₃.

Non-limiting examples of aryl groups are notably:

Non limitative examples of aryl amine groups are notably:

Non limitative examples of aryl groups are notably:

Non limitative examples of aryl sulfone groups are notably:

Non limitative examples of aryl thioether groups are notably:

Non limitative examples of fused aryl ring systems are notably:

Ri is preferably selected from —H alkyl groups, alkoxy groups, arylgroups and perfluorinated groups. R_(i) is more preferably selected fromthe group consisting of —H, —CH₃, —CF₃ and —CH₂CH₃. Most preferably,R_(i) is —H.

Preferably, the stabilizer compound (SC) is selected from the groupconsisting of formulas of compounds (A) to (G):

In a preferred embodiment, the stabilizer compound (SC) is selected fromthe group consisting of formulas of compound (A) and compound (B).

Another aspect of the present invention is directed to a method for themanufacture of said stabilizer compound (SC), which comprises the stepsof:

(i) reacting compounds of formulae (III) and (IV) together to obtaincompound of formula (V);

(ii) reacting compounds of formulae (V) and (VI) together in thepresence of a Lewis acid to obtain compound of formula (VII);

(iii) deprotecting the alkoxy moiety —OR_(m) in compound of formula(VII) to obtain compound of formula (I):

wherein:all R_(i), same or different from each other and from R_(j) and R_(k),are selected from the group consisting of —H, —NO₂, alkyl groups, alkoxygroups, perfluorinated groups, aryl groups, aryl amine groups, arylether groups, aryl sulfone groups, aryl thioether groups, and fused arylring systems,R_(k) is selected from:

-   -   a first group consisting of a —H, a halogen, a carboxylic ester,        an acid halide, an anhydride, an amide, and a thioester, or    -   a second group consisting of a hydroxyl, an amine, a carboxylic        acid, a thiol, and any protected derivatives thereof, or    -   a moiety of formula (VIII):

-   -   a moiety of formula (IX):

wherein R_(i) is as above described,R_(j) is as defined above for formula (I),X and Z are independently selected from halogens,M is selected from the group consisting of a metal, an alkali metal or—H, andR_(m) is an alkyl group.

In the formulas (III), (IV), (V) and (VII), the nature of the R_(i)'sare as defined above for formula (I), including all preferredembodiments.

In the formula (VII), the nature of the R_(j) is as defined above forformula (I), including all preferred embodiments.

In the formulas (III) and (V), R_(k) is preferably selected from:

-   -   a first group consisting of a —H, a halogen, an acid halide, and        an anhydride, or    -   a second group consisting of a hydroxyl, an amine, a carboxylic        acid, a thiol, and any protected derivatives thereof, or    -   a moiety of formula (VIII):

wherein R_(i) is as above described.

In the formulas (III) and (IV), X and Z may be the same or different andare preferably selected —Cl, —F and —Br. Most preferably, X and Z are—Cl.

M preferably selected from the group consisting of H, Na, Li, K,

Non-limitive example of R_(m) are notable —CH₃, —CH₂CH₃, —(CH₂)₅CH₃,(CH₂)₇CH₃, —CH₂OCH₃, —(CH₂)₂OCH₃, and

Most preferably, R_(m) is —CH₃.

The step (i) is preferably carried out in a polar aptotic solvent,preferably selected from tetrahydrofuran, dimethylsulfoxide,dimethylsulfone, diphenylsulfone, diethylsulfoxide, diethylsulfone,diisopropylsulfone, sulfolane and tetrahydrothiophene-1-monoxide,dimethylacetamide, dimethylformamide, N-methyl pyrrolidone and mixturesthereof. Excellent results were obtained when using sulfolane.

The steps (ii), and (iii) are also preferably carried out in a polaraptotic solvent, preferably selected from chloroform, dichloromethane,diethylether, hexane, toluene, 1,2-dichloroethane and mixtures thereof.Excellent results were obtained when using 1,2-dichloroethane.

The step (i) is preferably carried out at a temperature of between 140°C. and 250° C. at atmospheric pressure, more preferably between 170 and230° C. and most preferably between 190 and 220° C.

The steps (ii) and (iii) are preferably carried out at a temperature ofbetween 0° C. and 50° C. at atmospheric pressure, more preferablybetween 10 and 40° C. and most preferably between 15 and 35° C.Excellent results were obtained when the reactions were carried out atroom temperature.

The step (ii) involving compounds of formulae (V) and (VI) occurs in thepresence of a Lewis acid to obtain compound of formula (VII). The Lewisacid is preferably selected from the group consisting of AlCl₃, AlBr₃,BCl₃, BF₃, FeBr₃, FeCl₃, SnCl₄, and TiCl₄. Excellent results wereobtained when using AlCl₃.

In the formulas (III) and (V), the R_(k) may be selected from a secondgroup consisting of a hydroxyl, an amine, a carboxylic acid, a thiol,and any protected derivatives thereof. The term “protected derivative”is intended to denote the product of a reaction between the compound offormula (IV) where Y is a hydroxyl, an amine, a carboxylic acid, or athiol and a protecting group. The protected derivative can then undergoa chemoselective reaction with compound of formula (III) to lead to thecompound of formula (I) after a further step of deprotection. Theseprotection/deprotection steps may be carried out in various conditions,which are well known of the one skilled in the art. Examples of theprotecting group of hydroxyl groups include an acetyl group, amethoxyethyl group, and a tetrahydropyranyl group. Examples of theprotective group of amino groups include a tert-butoxycarbonyl group, abenzyloxycarbonyl group, and a phthaloyl group. Examples of theprotective group of carboxyl groups include a methyl group, an ethylgroup, a benzyl group, a p-nitrobenzyl group, a tert-butyl group and acyclohexyl group.

The use of a protected derivative in R_(k) in formulas (III) and (V) maybe sometimes advantageous to prevent, if necessary, the disubstitutionof the compound of formula (III) with the compound of formula (IV).

The Applicant has found out that the stabilizer compound (SC) accordingto the present invention can be used as a powerful light stabilizer forpolymers either per se, i.e. in a blend with a polymer (P*), or whenused as an end-capper of a polymer (P).

Therefore, still another aspect of the present invention is directed toan end-capped stabilized polymer (ESP) comprising recurring units and atleast two chain ends, wherein at least one of the chain ends comprisesthe moiety of the general structural formula (X):

wherein:all R_(i) are as above defined for formula (I), including all preferredembodiments.

Yet another aspect of the present invention relates to a method for themanufacture of the end-capped stabilized polymer (ESP) comprising thestep of reacting the stabilizer compound (SC) of the general structuralformula (I) where Rj is selected from:

-   -   a first group consisting of a —H, a halogen, a carboxylic ester,        an acid halide, an anhydride, an amide, and a thioester, and    -   a second group consisting of a hydroxyl, an amine, a carboxylic        acid, a thiol, and any protected derivatives thereof,        with at least:    -   a polymer (P) comprising at least one reactive chain end able to        react with the R_(j) of the general structural formula (I), or    -   a monomer (M) comprising at least two reactive groups; of which        at least one is able to react with the R_(j) of the general        structural formula (I).

The term “reactive chain end or group able to react with the R_(j) ofthe formula (I)” is intended to denote that the polymer (P) or themonomer (M) comprise at least one accessible functional group able toform, after its chemical reaction with the R_(j) of the stabilizercompound (SC) of the general structural formula (I), a covalent bond.Typically, this reaction may be a condensation or a transesterification.As discussed above, the R_(j) is selected from a first group consistingof a halogen, a carboxylic ester, an acid halide, an anhydride, anamide, and a thioester or from a second group consisting of a hydroxyl,an amine, a carboxylic acid, a thiol, and any protected derivativesthereof. The one skilled in the art will recognize that the nature ofthe available functional group on the polymer (P) or the monomer (M) mayvary depending on the nature of the R_(j).

For example, table 1 gives a list of possible reactive chain ends/groupswhich are able to react with the R_(j) of the general structural formula(I).

TABLE 1 Some possible combinations of reactive chain ends with R_(j) inthe invented method Reactive chain ends/groups R_(j) a hydroxyl ahalogen, a carboxylic ester, an acid chloride, an anhydride, or acarboxylic acid a halogen a hydroxyl or a thiol or an amine a carboxylicacid an amine, an alcohol, or a thiol an amine an acid halide, acarboxylic acid, an anhydride, or a carboxylic ester an amide an amide acarboxylic ester a carboxylic ester, a hydroxyl, an amine, or a thiol

Therefore, the at least one reactive chain end or the at least onereactive group is able to react with the R_(j) is preferably selectedfrom the group consisting of a hydroxyl, a halogen, a carboxylic acid,and an amine.

The level of end capping of the stabilizer compound (SC) of the generalstructural formula (I) on the obtained end capped stabilized polymer(ESP) can thus be controlled via the quantity of the stabilizer compound(SC) used, its reactivity, the reaction conditions and whether thestabilizer compound (SC) is introduced on the polymer (P) or during thepolymerization of the monomer (M).

A wide range of polymers (P) may be used in the present invention, aslong as they contain at least one chain end able to react with the R_(j)of the general structural formula (I).

The polymer (P) comprising at least one reactive chain end isadvantageously an aromatic polymer comprising more than 35 mol %,preferably more than 45 mol %, more preferably more than 55 mol %, stillmore preferably more than 65 mol % and most preferably more than 75 mol% of recurring units which are aromatic recurring units, based on thetotal number of moles of recurring units in the polymer (P). For thepurpose of the present invention, the expression “aromatic recurringunit” is intended to denote any recurring unit that comprises at leastone aromatic group in the main polymer backbone.

In certain embodiments, the polymers (P) advantageously comprise atleast 5, preferably at least 10 recurring units. On the other hand, thepolymers of the polymer composition (C) advantageously comprise at most20, preferably at most 15 recurring units.

In certain other embodiments, the polymers (P) advantageously compriseat least 50, preferably at least 100 recurring units. On the other hand,the polymers (P) advantageously comprise at most 300, preferably at most300 recurring units.

The polymer (P) may be a semi-crystalline polymer or an amorphouspolymer. Semi-crystal line polymers (P) may typically have glasstransition temperatures of at least 120° C., preferably at least 140° C.and melting temperatures generally greater than 250° C., preferablygreater than 300° C.

Amorphous polymers (P) typically have a glass transition temperature ofat least 140° C., more typically of at least 150° C. and up to 200° C.Glass transition temperature (Tg) and melting temperature (Tm) aregenerally determined by DSC, according to ASTM D3418.

The polymer (P) may notably be selected from the group consisting ofpolyolefins, polyesters, polyethers, polyketones, poly(etherketone)s,poly(ethersulfone)s, polyamides, polyurethanes, polystyrenes,polyacrylates, polymethacrylates, polyacetals, polytetrafluoroethylene,polyvinylidene fluoride, polyacrylonitriles, polybutadienes,acrylonitrile butadiene styrene, styrene acrylonitrile, acrylate styreneacrylonitrile, cellulosic acetate butyrate, cellulosic polymers,polyimides, polyamideimides, polyetherimides, polyphenylsulfides,polyphenylene oxides, polyvinylchlorides, polyvinylbutyrates,polycarbonates, epoxy resins, polysiloxanes, and polyketimines.

Among the more preferred polymers (P), one may cite the aromaticpoly(sulfone)s, aromatic poly(ether ketone)s such as poly(ether etherketone)s (PEEK), aromatic poly(amide)s, aromatic poly(imide)s,poly(phenylene)s, and aromatic liquid crystalline polymers.

Aromatic poly(sulfone)s include notably polyphenylsulfone, polysulfone,polyethersulfone, and polyetherethersulfone, the structural repeat unitsof which are listed below:

Aromatic poly(ether ketone)s include notably poly(etherketone),poly(etheretherketone) and poly(etherketoneketone), the structuralrepeat units of which are listed below

When the method for the manufacture of the end capped stabilized polymer(ESP) comprises the step of reacting the stabilizer compound (SC) of thegeneral structural formula (I) with at least a polymer (P) comprising atleast one reactive chain end, the reaction can take place at the end ofthe polymerization reaction of the polymer (P) or after the polymer (P)has been isolated.

Among methods for the manufacture of the end capped stabilized polymer(ESP) comprising the step of reacting the stabilizer compound (SC) ofthe general structural formula (I) with at least a polymer (P)comprising at least one reactive chain end, one can mention a methodcomprising a step of comprising the reactive extrusion where thestabilizer compound (SC) of formula (I) is extruded with at least onepolymer (P) to obtain the end capped stabilized polymer (ESP).

In addition to the above described polymer (P), at least one monomer (M)can also be used in the method for the manufacture of the end cappedstabilized polymer (ESP) according to the present invention, as long asit contains at least two reactive groups: of which at least one is ableto react with the R_(j) of the general structural formula (I).

Monomers (M) include notably di-(4-fluoro-phenyl)sulfone, di-(4-chloro)phenyl)sulfone, 4,4′-biphenol; hydroquinone, 4,4′-dihydroxybiphenyl,resorcinol, dihydroxynaphthalene (2,6 and other isomers),4,4′-dihydroxydiphenyl ether or -thioether, 4,4′-dihydroxybenzophenone,2,2′-di-(4-hydroxyphenylpropane (bisphenol A) or -methane,4,4′-oxybis(phenol), and hexafluoroisopropylidene diphenol.Di-(4-fluoro-phenyl)sulfone and 4-4′-biphenol are preferred as monomer(M).

When the method for the manufacture of the end capped stabilized polymer(ESP) comprises the step of reacting the stabilizer compound (SC) of thegeneral structural formula (I) with at least a monomer (M) comprising atleast two reactive groups, the reaction advantageously takes place inthe presence of a polar aproric solvent, including notablytetrahydrofurane (THF), N,N-dimethylformamide (DMF),N,N-dimethylacetamide (DMAc), N-methyl-2-pyrrolidone, diphenylsulfone,and toluene. The stabilizer compound (SC) of the general structuralformula (I) and the at least one monomer (M) may be contacted togetherin any order.

The reaction temperature is generally higher than 80° C., preferablyhigher than 120° C., more preferably higher than 140° C. Thepolymerization is generally carried out for a duration exceeding onehour, and the duration of the polymerization may exceed 10 hours.

The reaction also advantageously takes place in the presence of a basesuch as an alkaline metal salt, for instance, potassium or sodiumcarbonate.

Thus, another aspect of the present invention relates to a polymercomposition (C), comprising at least one of the above disclosedstabilizer compounds (SC) and at least one polymer (P*). The polymer(P*) of the polymer composition (C) may be the same than the abovementioned polymer (P) (including all preferred embodiments), except forthe fact that it does not have to (but may) contain at least one chainend able to react with the R_(j).

The polymer composition (C) may also further comprises at least anotheringredient selected from the group consisting of dyes, pigments,fillers, UV stabilizers, light stabilizers, optical brighteners.

The polymer composition (C) comprises advantageously at least 0.01 wt.%, preferably at least 0.05 wt. %, more preferably at least 0.1 wt. %,still more preferably at least 0.5 wt. % and most preferably at least 1wt. % of the stabilizer compounds (SC), based on the total weight of thepolymer composition (C). Also, the polymer composition (C) comprisesadvantageously at most 15 wt. %, preferably at most 10 wt. %, morepreferably at most 8 wt. %, still more preferably at most 5 wt. % andmost preferably at most 3 wt. % of the stabilizer compounds (SC), basedon the total weight of the polymer composition (C).

When no other ingredient than the stabilizer compound (SC) and the atleast one polymer (P*) are present, the polymer composition (C)comprises advantageously at least 20 wt. %, preferably at least 30 wt.%, more preferably at least 40 wt. %, still more preferably at least 50wt. % and most preferably at least 60 wt. % of the at least one polymer(P*), based on the total weight of the polymer composition (C). Also,the polymer composition (C) comprises advantageously at most 99.99 wt.%, preferably at most 99.95 wt. %, more preferably at most 99.90 wt. %,still more preferably at most 99.5 wt. % and most preferably at most 99wt % of the at least one polymer (P*), based on the total weight of thepolymer composition (C).

The polymer composition (C) may further comprise at least one additionalstabilizer selected from the group consisting of 2-(2′-hydroxyphenyl)benzotriazoles, oxamides, 2-(2 hydroxyphenyl)1,3,5-triazines, other2-hydroxybenxophenone derivatives, cyanoacrylates, benzo-oxazolines,benzoxazinones, and hindered phenolic antioxidants.

It may be advantageous to further incorporate in the polymer composition(C) hindered amine light stabilizers (“HALS”). Examples of such HALS are(2,2,6,6-tetramethylpiperidyl) sebacate, (2,2,6,6-tetramethylpiperidyl-)succinate, condensate of1-hydroxyethyl-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinicacid, condensate of N,N′-bis(2,2,6,6-tetramethyl-1-4-piperidyl)hexamethylene diamine and4-tert-octylamino-2,6-dichloro-1,3,-5-s-triazine,tris(2,2,6,6-tetramethyl-4-piperidyl) nitrilotriacetate, tetrakis(2,2,6,6-tetramethyl-4-piperidyl) 1,2,3,4 butanetetraoate,1,1′-(1,2-ethanediyl)-bis(3,3,5,5-tetramethylpiperazinone),4-benzoyl-2,2,6,6tetramethylpiperidine, 4-stearyloxy-2,2,6,6-tetramethyl piperidine, to(1,2,2,6,6-pentamethylpiperidyl) 2-n-butyl-2(2-hydroxy-3,5-di-tert-butylbenzyl) malonate,3-n-octyl-7,7,9,9-tetramethyl-1,3,8-triazas-piro[4.5]decane-2,4-dione,to (1-octyloxy-2,2,6,6-tetramethylpiperidyl) sebacate,(1-octyloxy-2,2,6,6-tetramethylpiperidyl) succinate, condensate ofN,N′-bis (2,2,6,6-tetramethyl-4-piperidyl) hexamethylenediamine, andcompounds with similar chemical structures. As with the stabilizercompounds (SC) of the present disclosure, the HALS may be incorporatedin the polymer composition (C) in conventional amounts, generally higherthan 0.05 wt. % and preferably higher than 0.1 wt. %; further, theseamounts are generally lower than 5 wt. % and preferably lower than 1 wt.%.

Further in accordance with the present disclosure, the polymercomposition (C) may also contain a variety of other polymer additives inaddition to the stabilizer compounds of the present disclosure. Theseadditives may include fillers in spherical, spheroidal or polyhedralform, collectively known as “ingredients” herein. Among these otherfillers, calcium carbonate, calcium sulfate, barium sulfate, glassbeads, ceramic beads, antimony trioxide, zinc borate, and other metalsalts and oxides, can be utilized.

Other optional conventional ingredients of the complete polymercomposition (C) include nucleating agents such as silica, adhesionpromoters, compatibilizers, curing agents, lubricants, mold releaseagents, dyes and colorants, smoke-suppressing agents, heat stabilizers,antioxidants, UV absorbers, tougheners such as rubbers, plasticizers,anti-static agents, melt viscosity depressants such as liquidcrystalline polymers, and compounds of similar structures. The choice offillers and other ingredients in the final polymer composition (C)including the stabilizer compounds of the present disclosure will dependprimarily on the intended use for the articles of manufacture.

The components of the polymer composition (C) along with the optionaladditional ingredients may be incorporated into the polymer composition(C) by a variety of different methods and procedural steps which aim toprovide their collective improvement in stability properties throughoutthe mixture. For example, it is possible to incorporate the abovementioned components and optional additional ingredients by mixing theminto the polymer at an early processing stage, or at the start or at theend of the synthesis reaction, or in a subsequent compounding process. Acertain method comprises dry mixing the essential components andoptional ingredients in powder or granular form, in appropriateproportions, using e.g. a mechanical blender, such as a drum blender andcompounds of similar structures. The mixture is then melted batch-wiseor in a continuous device, e.g. extruders and compounds of similarstructures, extruding the mixture into strands and chopping the strandsinto pellets. The mixture to be melted may also be prepared bywell-known master-batch methods. The continuous melting device may alsobe fed with the components and ingredients of the polymer composition(C) added separately without dry premixing. A certain other methodcomprises dissolving the polymer(s) in one or more organic solvents thencausing the dissolved polymer(s) to precipitate by the addition of anon-solvent, and finally molding the recovered dried cake.

Of particular use tor the polymer composition (C) of the presentinvention is the manufacture of shaped articles. Therefore, anotheraspect of the present invention relates to an article comprising thepolymer composition (C).

Indeed, the outstanding balance of advantageous properties featured bythe polymer compositions (C) of the present invention in connection withtheir high glass transition temperature, thermal stability, flameresistance, chemical resistance and melt processability, makes themparticularly suitable for the manufacture, by any known processingmethod, of various articles. The article of the present invention may beproduced by extrusion or molding techniques.

Various molding techniques may be used to form shaped articles or partsof shaped articles from the polymer composition (C). Powders, pellets,beads, flakes, reground material or oilier forms of the polymercomposition (C) may be molded, with or without liquid or otheradditives, pre mixed or fed separately. The polymer composition (C) maynotably be molded into a film, a sheet, a fiber, a foam or any moldedarticle suitable for indoor and outdoor applications.

A last aspect of the present invention relates to a method forstabilizing a polymer (P) or (P*) comprising adding at least onestabilizer compound (SC) or at least one end-capped stabilized polymer(ESP) to at least one polymer (P) or to at least one polymer (P*),wherein the polymer (P), contains at least one chain end able to reactwith the above mentioned R_(j) of formula (I), and wherein the polymer(P*) may be the same than the polymer (P), except for the fact that itdoes not have to (but may) contain at least one chain end able to reactwith the R_(j) of formula (I).

In particular, the at least one stabilizer compound (SC) may act as anacid scavenger for the at least one polymer (P) or (P*).

The disclosure will now be illustrated with working examples, which areintended to illustrate the working disclosure and not intended to takerespectively to imply any limitations on the scope of the presentdisclosure.

EXAMPLES

Materials:

-   -   Udel® PSU polysulfone, available from Solvay Specialty Polymers        USA, L.L.C.    -   Compounds (A) and (B), two stabilizer compounds according to the        invention, which synthesis are disclosed below, having        respectively the following chemical structures:

-   -   Commercial stabilizers belonging to the same        2-hydroxybenzophenone class than compounds (A) and (B), namely,        Chimasorb® 81, available from BASF, and Lowilite® 24, available        from Addivant USA, having respectively the following chemical        structures:

Synthesis and Characterization of Stabilizer Compound (A)

The compound (A) was prepared in two steps:

Synthesis of 1-phenoxy-4-(phenylsulfonyl)benzene

4-Chloradiphenyl sulfone (20.00 g, 0.0791 mol), sodium phenolate (8.41g, 0.0495 mol, and sulfolane (100 mL), were combined, heated to 210° C.for 7 h, and then cooled to ca. 60° C., at which point the reactionmixture was diluted with H₂O (500 mL), and extracted with CH₂Cl₂ (3×250mL). The combined organic layers were then dried over anhydrous MgSO₄,filtered, and the solvent wax removed in vacuo to afford a viscousyellow oil that, upon standing overnight, solidified. Followingrecrystallization from ethanol/water pure,1-phenoxy-4-(phenylsulfonyl)benzene (4.23 g, 57.94%) was isolated as awhite crystalline solid. ¹H NMR (CDCl₃): δ=7.93 (m, 2H, SO₂ArH), 7.88(m, 2H, SO₂ArH), 7.57-7.46 (m, 3H, OArH+ArH), 7.39 (m, 2H, OArH), 7.21(m, 1H, ArH), 7.04-6.99 (m, 4H, OArH+ArH). ¹³C NMR (CDCl₃): δ=162.1 (1C,CH_(Ar)O) 154.8 (1C, C_(Ar)O), 142.0 (1C, SO₂C_(Ar)), 134.9 (1C,SO₂C_(Ar)), 133.0 (1C, CH_(Ar)), 130.1 (2C, CH_(Ar)), 129.9 (2C,CH_(Ar)), 129.2 (2C, CH_(Ar)), 127.4 (2C, CH_(Ar)), 125.0 (1C, CH_(Ar)),120.3 (2C, CH_(Ar)), 117.6 (2C, CH_(Ar)). HRMS (ASAP with APCI): m/z311.0818 (M+H, calculated, for C₁₈H₁₄O₃S 311.0742).

Synthesis of(2-hydroxyphenyl)(4-(4-(phenylsulfonyl)phenoxy)phenyl)methanol

A solution of o-anisoyl chloride (27.45 g, 0.161 mol) was dissolved in1,2-Dichiorethane (100 mL) and added drop-wise to a nitrogen purgedreaction vessel containing AlCl₃ (27.45 g, 0.2055 mol),1-phenoxy-4-(phenylsulfonyl)benzene (5 g, 0.0161 mol) and1,2-Dichlorethane (100 mL). Upon complete addition, the reaction wasallowed to stir at for 4 days at 25° C. Subsequently, H₂O (125 mL) wasadded, then 1 N HCL (125 mL), and the mixture was then extracted withCH₂Cl₂ (3×200 mL). The combined organic layers were rotovapped todryness to afford a dark solid that was stirred with 1 N KOH (300 mL)and CH₂Cl₂ (200 mL) for 2 h at 25° C. to convert un-reacted carboxylatesto water soluble sodium carboxylate salts. This mixture was thenextracted with dichloromethane (2×200 mL) and organic layers werecombined, dried over anhydrous MgSO₄, filtered, and the solvent removedto afford a viscous, dark orange, oil comprised predominately of thedeprotected 2-hydroxybenzophenone derivative as determined using thinlayer chromatography (TLC) (SiO₂, eluent: 1:2 ethyl acetate/hexane,R_(f)=0.54). The final product,(2-hydroxyphenyl)(4-(4-(phenylsulfonyl)phenoxy)phenyl) methanol (3.25 g,47%), was isolated via column chromatography (SiO₂ eluent: 1:3 ethylacetate/hexane gradient with 1:2 ethyl acetate/hexane) as a light yellowsolid, ¹H NMR (DMSO-d6): δ=10.35 (s, 1H, OH), 7.99 (m, 4H, SO₂CCH_(Ar)),7.78 (m, 2H, O═CCCH_(Ar)), 7.70 (m, 1H, O═CCCH_(Ar)), 7.63 (m, 2H,CH_(Ar)), 7.43 (m, 1H, CH_(Ar)), 7.34 (m, 1H, CH_(Ar)), 7.25 (m, 4H,CH_(Ar)), 6.95 (m, 2H, CH_(Ar) HRMS (ASAP with APCI): m/z 431.1024 (M+H,calculated for C₂₅H₁₉O₅S 431.0953).

Synthesis and Characterization of Stabilizer Compound (B)

The compound (B) was also prepared in two steps:

Synthesis of 4,4′-sulfonylbis(phenoxybenzene)

4-4′ difluorodiphenylsulfone (20.00 g, 0.0786 mol), sodium phenolate(36.75 g, 0.3166 mol, and sulfolane (100 mL), were combined and heatedto 200° C. for 5 h at which point the reaction was checked using GC-MS,which showed 100% conversion to the desired product with no detectableconcentration of the monosubstituted product. Following cooling to 25°C., the reaction mixture was then diluted with 1 N KOH (250 mL) and thecrude product was extracted from the resulting aqueous emulsion usingCH₂Cl₂ (3×200 mL). The combined organic layers were then dried overanhydrous MgSO₄, filtered, and the solvent was removed in vacuo toafford a semisolid that was triturated with and EtOH/H₂O mixture (400mL/10 mL) to give 4,4′-sulfonylbis(phenoxybenzene) (27.44 g, 86.75%) asa white powder that was collected via suction filtration and later driedon high vacuum. ¹H NMR (DMSO-d6): δ=7.91 (m, 4H, SO₂CArH), 7.46 (m, 4H,OCArH), 7.27 (m, 2H, ArH), 7.12 (m, 8H, OCArH+ArH). HRMS (ASAP withAPCI): m/z 403.1083 (M+H, calculated for C₂₄H₁₉O₄S 403.1004).

Synthesis of(((sulfonylbis(4,1-phenylene))bis(oxy))bis(4,1-phenylene))bis((2-hydroxphenyl)methanone)

A solution of o-anisoyl chloride (42.30 g, 0.248 mol) was dissolved in1,2-Dichlorethane (100 mL) and added drop-wise to a nitrogen purgedreaction vessel containing AlCl₃ (33 g, 0.248 mol),4,4′-sulfonylbis(phenoxybenzene) 4,4′-sulfonylbis(phenoxybenzene) (5 g,0.0161 mol) and CH₂ClCH₂Cl (100 mL). Upon complete addition, thereaction was allowed to stir at for 2 days at 25° C. Subsequently, H₂O(100 mL) was added, then 1 N HCL (100 mL, pH=0), and the mixture wasthen extracted with CH₂Cl₂ (3×200 mL). The combined organic layers wererotovapped to dryness to afford a dark solid that was stirred with 1 NKOH (300 mL) and CH₂Cl₂ (200 mL) for 2 h at 25° C. to convert un-reactedcarboxylates to water soluble sodium carboxlyate salts. This mixture wasthen extracted with CH₂Cl₂ (2×200 mL) and organic layers were combined,dried over anhydrous MgSO₄, filtered, and the solvent removed to afforda viscous, dark orange, oil comprised of a mixture of deprotected andmethoxy protected 2-hydroxy-benzophenones as determined using TLC (SiO₂,eluant: 1:2 ethyl acetate/hexane). To convert the protected4,4′-sulfonylbis2-methoxybenzophenone to the desired deprotected4,4′-sulfonylbis2-hydroxybenzophenone, the product mixture was dissolvedin toluene (125 mL), treated by the addition of solid AlBr₃ (14.32 g,0.0537 mol), and the resulting mixture was then heated to reflux for 1h, cooled to room temperature, and stirred at 25° C. overnight.Subsequently, the reaction mixture was treated with 1 M HCl (375 mL) toneutralize any residual AlBr₃ and was then stirred for 1 h at 25° C. atwhich point the aqueous layer was extracted with toluene (3×100 mL) andseparated. The combined organic layers were then dried over anhydrousMgSO₄, filtered, and the solvent removed in vacuo to afford a darkviscous oil. Purification via column chromatography (SiO₂, eluant: 1:3ethyl acetate/hexane gradient with 1:2 ethyl acetate/hexane,R_(f)=0.48), afforded pure(((sulfonylbis(4,1-phenylene))bis(oxy))bis(4,1-phenylene))bis((2-hydroxyphenyl)methanone)as a pale yellow solid (3.7 g, 48.2%). ¹H NMR (DMSO-d6): δ=10.34 (s, 2H,OH), 8.00 (m, 4H, SO₂CCHAr), 7.79 (m, 4H, O═CCCHAr), 7.43 (m, 2H, CHAr),7.34 (m, 2H, CHAr), 7.28-7.22 (m, 8H, CHAr), 6.99-6.92 (m, 4H, CHAr).HRMS (ASAP with APCI): m/z 642.1192 (M+, calculated for C₃₈H₂₆O₈S642.1348).

UV stability of films of Udel® PSU polysulfone containing 5 mol. % ofcompounds (A) and (B) and the two commercial 2-hydroxybenzophenonestabilizers, Chimasorb® 81 and Lowilite® 24.

Solution blending an film preparation for weathering experiments: thepolysulfone was solution blended with stabilizer compound (A) at 5 mol %loading, based on the total number of moles of recurring units in thepolymer. This was accomplished by first dissolving 0.266 g of thestabilizer compound (A) and 5.00 g of polymer in NMP to prepare a 25 wt.% solution containing thus 5.04 wt. % of the stabilizer compound (A),followed by film casting onto a glass plate pre-heated to 100° C. usinga 15 mil side of a square applicator (BYK Gardener). The resulting4″×4″×50 micron thick film was dried (on a glass plate) using a vacuumoven (120° C., >25 mmHg) for 48 h, at which point the film was removedfrom the glass substrate using a razor blade. The free-standing film wasthen cut into 10 mm×100 mm×50 μm thick strips using a precision trammelcutter and mounted onto an aluminum frame designed for use in an Atlasci4000 Xenon weather-o-meter. The same procedure was applied to preparefilms comprising 5 mol. % of compound (B), Chimasorb® 81 and Lowilite®24.

UV Weathering: All weathering experiments were carried out in 24/48 hourincrements for up to 5 days using an Atlas ci4000 Xenon weather-o-meterwhich was also further equipped with a Type “S” borosilicate innerfilter and a soda lime outer filter. The cut-off filters eliminated allwavelengths above 340 nm. All weathering cycles were set for anirradiance of 0.30 w/m², with a panel temperature of 55° C., a chambertemperature of 38° C., and a RH 55%. All other variables were controlledin accordance with ASTM G155-4.

Measure of UV Stability: Following exposure to UV light via theweatherometer conditions described above, each film was subsequentlyplaced in a UV Vis spectrophotometer set to transmission mode and theUV-Vis spectra was collected. The change in % Transmission as a functionof exposure time was determined at 400 nm as a measure of the extent ofUV degradation of the polymeric film at a particular exposure time. Thelower the % transmission, the more the film had degraded upon exposureto UV light.

TABLE 1 Transmission (%) vs. UV exposure time of films of Udel ® PSUwith and without stabilizers UV Exposure Time Udel ® Udel ® PSU + Udel ®PSU + Udel ® PSU + Udel ® PSU + (days) PSU compound (A) compound (B)Chimasorb ® 81 Lowilite ® 24 0 100 100 100 100 100 1 88.6 100.9 100.299.6 99.7 3 83.6 100.4 99.9 99.6 99.4 5 79.8 100.5 99.8 98.7 98.9

As one may see from the data presented in table 1, the presence of thestabilizers greatly improved the UV resistance of Udel® PSU films.Interestingly, compounds (A) and (B) gave better results than the twocommercial stabilizers tested for comparative purposes. Surprisingly,the presence of compound (A) even lead to transmission data which werehigher than the original un-weathered film.

The thermal stabilities of the four tested stabilizers were alsoanalyzed by measuring their volatility. This was achieved by determiningthe temperature at which 10 wt. % and 50 wt. % loss was observed bythermal gravimetric analysts (TGA). Results are reported in Table 2.

TABLE 2 Volatility of the compounds Compound Compound Chimasorb ®Lowilite ® Stabilizer (A) (B) 81 24 10% 325° C. 419° C. 248° C. 232° C.wt. Loss 50% 380° C. 483° C. 289° C. 278° C. wt. Loss

In addition, to their demonstrated efficiency to stabilize aromaticpolymers with regard to UV degradation, the stabilizer compoundsaccording to the invention also presented the benefit of having a goodthermal stability (see TGA data in Table 2). Compounds (A) and (B)behaved very differently with regard to their volatility when comparedto the two commercial 2-hydroxybenzophenone stabilizers, Chimasorb® 81and Lowilite® 24, which present a 10% wt. loss already before 300° C.

Moreover, Compound (B) also presents the further benefit of maintainingthe high Tg of the high performance aromatic polymers when it is blendedin them. A 5 mol % loading of Compound (B) reduced the Tg of the polymerof only about 10° C., whereas the same concentration of the twocommercial 2-hydroxybenzophenone stabilizers, Chimasorb® 81 andLowilite® 24 reduced the Tg of the same polymer of respectively 32° C.and 20° C.

The stabilizer compounds according to the invention are thus very usefulfor the stabilization of high performance aromatic polymers since theycombine the stabilization effect with regard to UV degradation and thehigh temperature resistance and non-volatility under the high thermalprocessing temperatures of high performance aromatic polymers (i.e. asan example, the process window for sulfone polymers is ca. 300-425° C.).

The invention claimed is:
 1. A stabilizer compound (SC) of the generalstructural formula (I):

wherein: R_(j), same or different from R_(i), is selected from: a firstgroup consisting of a —H, a halogen, a carboxylic ester, an acid halide,an anhydride, an amide, and a thioester, a second group consisting of ahydroxyl, an amine, a carboxylic acid, a thiol, and any protectedderivatives thereof, a moiety of formula (II):

 or a moiety of formula (II*):

 and R_(i), same or different from each other and from R_(j), areselected from the group consisting of —H, —NO₂, alkyl groups, alkoxygroups, perfluorinated groups, aryl groups, aryl amine groups, arylether groups, aryl sulfone groups, aryl thioether groups, and fused arylring systems.
 2. The stabilizer compound (SC) according to claim 1,wherein said R_(i) are —H.
 3. The stabilizer compound (SC) according toclaim 1, wherein it is selected from the group consisting of compound(A) and compound (B):


4. A method for making the stabilizer compound (SC) according to claim1, comprising the steps of: (i) reacting compounds of formulae (III) and(IV) together to obtain compound of formula (V);

(ii) reacting compounds of formulae (V) and (VI) together in thepresence of a Lewis acid to obtain compound of formula (VII);

(iii) deprotecting the alkoxy moiety —OR_(m) in compound of formula(VII) to obtain compound of formula (I):

wherein: all R_(i), same or different from each other and from R_(j) andR_(k), are selected from the group consisting of —H, —NO₂, alkyl groups,alkoxy groups, perfluorinated groups, aryl groups, aryl amine groups,aryl ether groups, aryl sulfone groups, aryl thioether groups, and fusedaryl ring systems, R_(k) is selected from: a first group consisting of a—H, a halogen, a carboxylic ester, an acid halide, an anhydride, anamide, and a thioester, or a second group consisting of a hydroxyl, anamine, a carboxylic acid, a thiol, and any protected derivativesthereof, or a moiety of formula (VIII):

 or a moiety of formula (IX):

R_(j) is selected from: a first group consisting of a —H, a halogen, acarboxylic ester, an acid halide, an anhydride, an amide, and athioester, or a second group consisting of a hydroxyl, an amine, acarboxylic acid, a thiol, and any protected derivatives thereof, or amoiety of formula (II):

a moiety of formula (II*):

X and Z are independently selected from halogens, M is selected from thegroup consisting of a metal, an alkali metal or —H, and R_(m) is analkyl group.
 5. The method of claim 4, wherein the steps (ii) and (iii)are carried out in a polar aprotic solvent.
 6. A polymer composition (C)comprising at least one stabilizer compound (SC) according to claim 1and at least one polymer (P*).
 7. The polymer composition (C) accordingto claim 6, wherein the polymer (P*) is selected from the groupconsisting of polyolefins, polyesters, polyethers, polyketones,poly(etherketone)s, poly(ethersulfone)s, polyamides, polyurethanes,polystyrenes, polyacrylates, polymethacrylates, polyacetals,polytetrafluoroethylene, polyvinylidene fluoride, polyacrylonitriles,polybutadienes, acrylonitrile butadiene styrene polymers, styreneacrylonitrile polymers, acrylate styrene acrylonitrile polymers,cellulosic acetate butyrate polymers, cellulosic polymers, polyimides,polyamideimides, polyetherimides, polyphenylsulfides, polyphenyleneoxides, polyvinylchlorides, polyvinylbutyrates, polycarbonates, epoxyresins, polysiloxanes, and polyketimines.
 8. The polymer composition (C)according to claim 7, wherein it further comprises at least anotheringredient selected from the group consisting of dyes, pigments,fillers, UV stabilizers, light stabilizers, optical brighteners, andcombinations thereof.
 9. A method for stabilizing a polymer (P) or (P*)comprising adding at least one stabilizer compound (SC) according toclaim 1 to at least one polymer (P) or to at least one polymer (P*),wherein the polymer (P), contains at least one chain end able to reactwith the Rj in formula (I) of the stabilizer compound (SC), and whereinthe polymer (P*) may be the same than the polymer (P), with the provisothat it does not have to, but may optionally, contain at least one chainend able to react with the Rj of formula (I).
 10. An article comprisingsaid stabilizer compound (SC) according claim
 1. 11. An articlecomprising said polymer composition (C) according to claim 7.